Elkin, B.B.ElkinMayer, J.J.MayerSchindler, B.B.SchindlerVohrer, UweUweVohrer2022-03-032022-03-031999https://publica.fraunhofer.de/handle/publica/19506710.1016/S0257-8972(99)00352-7Plasma polymer layers were deposited from perfluoropropene plasma on rough and polished silicon wafers. Deposition was performed in a novel plasma apparatus using a special electrode arrangement for high lateral homogeneity of the deposits. The deposition parameters were optimized to develop highly hydrophobic layers with good de-wetting properties and adherence. The best results could be achieved by using a pulse plasma with on/off ratios of 1/5 ms. The water contact angle under receding conditions could be enhanced up to 97 degree.enhydrophobic layerplasma polymerizationwettability610620660543journal article