Schultrich, BerndBerndSchultrich2022-03-082022-03-082018https://publica.fraunhofer.de/handle/publica/29892410.1007/978-3-662-55927-7This book presents the status quo of the structure, preparation, properties and applications of tetrahedrally bonded amorphous carbon (ta-C) films and compares them with related film systems. Tetrahedrally bonded amorphous carbon films (ta-C) combine some of the outstanding properties of diamond with the versatility of amorphous materials. The book compares experimental results with the predictions of theoretical analyses, condensing them to practicable rules. It is strictly application oriented, emphasizing the exceptional potential of ta-C for tribological coatings of tools and components.Part I Carbon Materials and Coatings // 1 Carbon // 1.1 Carbon Bonds // 1.2 Diamond // 1.3 Graphite // 1.4 The Diamond-Graphite Transition // 1.5 Engineering Carbon Materials // 1.6 Melting of Carbon Materials // 1.7 Vaporization of Carbon Materials // 1.8 Rules and Theses // 2 Diamond Films // 2.1 Growth // 2.2 Deposition Methods // 2.3 Nucleation // 2.4 Film Structure and Surface Morphology // 2.5 Properties and Applications // 2.6 Rules and Theses // 3 Nanodiamond Films // 3.1 Preparation // 3.2 Properties and Applications // 3.3 Low Temperature Deposition // 3.4 Rules and Theses // 4 Amorphous Carbon Films // 4.1 Classification // 4.2 Hydrogen Content // 4.3 Rules and Theses // 5 Hydrogenated Amorphous Carbon Films (a-C:H) // 5.1 Overview // 5.2 Preparation // 5.3 Growth // 5.4 Hydrogen Content // 5.5 Structure // 5.6 Properties // 5.7 Applications // 5.8 Nonmetal Containing a-C:H:X Films // 5.9 Metal Containing a-C:H:Me Films // 5.10 Rules and Theses // Part II Structural Development of ta-C Films // 6 Structure of Amorphous Carbon // 6.1 Structural Characterization of Amorphous Carbon // 6.2 Modelling of ta-C Structures // 6.3 Structure of Amorphous Silicon // 6.4 Structure of Liquid Carbon // 6.5 Structure of ta-C with Highest sp3 Content // 6.6 Structure of ta-C with Reduced sp3 Content // 6.7 Top Layer // 6.8 Ultrathin Films // 6.9 Rules and Theses // 7 Influence of Deposition Conditions // 7.1 Ion Beam Deposition // 7.2 Energy of the Incident Carbon Ions // 7.3 Angle of Incidence // 7.4 Substrate Temperature and Deposition Rate // 7.5 Layered Carbon Films // 7.6 Rules and Theses // 8 Growth of ta-C Films // 8.1 Subplantation // 8.2 Collision Cascade // 8.3 Impact-Induced Film Growth // 8.4 Thermally Modified Film Growth // 8.5 Rules and Theses // Part III Vacuum Arc Deposition of Carbon Films // 9 Vacuum Arc Discharges with Carbon Cathodes // 9.1 Current-Voltage Characteristic // 9.2 Cathode Spots // 9.3 Arc Plasma // 9.4 Macroparticles // 9.5 Peculiarities of Graphite Ablation by Vacuum Arc Discharges // 9.6 Carbon Film Deposition with Vacuum Arc Discharges // 9.7 Rules and Theses // 10 Methods of Vacuum Arc Deposition of ta-C Films // 10.1 Magnetically Driven DC Vacuum Arcs // 10.2 Pulsed High Current Vacuum Arcs // 10.3 Arc Ignition with High Repetition Rates // 10.4 Rules and Theses // 11 Vacuum Arc with Particle Filtering // 11.1 Concept of Magnetic Filtering // 11.2 Macroparticle Filter Efficiency // 11.3 Plasma Filter Transparency // 11.4 Filter Systems for Minimum Macroparticle Transparency // 11.5 Filter Systems for Large Area Deposition // 11.6 Compact Arc Filters // 11.7 Rules and Theses // 12 Special Arc Modes with Reduced Macroparticle Emission // 12.1 Distributed Arc // 12.2 Stationary Arc // 12.3 Shunting Arc // 12.4 Rules and Theses // 13 Vacuum Arc Equipment for Mass Production of ta-C Coatings // 13.1 Demands on Industrial Equipment for Coating of Tools and Components // 13.2 Technological Cycle // 13.3 Industrial Vacuum Arc Devices for ta-C Deposition // 13.4 Rules and Theses // Part IV Deposition of ta-C Films by Pulsed Laser and by Sputtering // 14 Carbon Ablation with ns Lasers // 14.1 PLD Arrangement // 14.2 Target Heating // 14.3 Target Ablation // 14.4 Plasma Formation // 14.5 Plasma Beam // 14.6 Plasma Energies // 14.7 Rules and Theses // 15 Carbon Film Deposition with ns Lasers // 15.1 Influence of Laser Intensity // 15.3 Macroparticles // 15.4 Influence of the Target Material // 15.5 Rules and Theses // 16 Related Deposition Methods // 16.1 Comparison of PLD and Vacuum Arc Deposition of ta-C Films // 16.2 ns-PLD with Additional Activation // 16.3 Peculiarities of Carbon Deposition with ps and fs Lasers // 16.4 Rules and Theses // 17 Activated Sputter Deposition of ta-C Films // 17.1 Sputtering of Carbon // 17.1.2 Energy of the Sputtered Carbon Particles // 17.2 Dual Ion Beam Sputtering // 17.3 Magnetron Sputtering // 17.4 High Power Impulse Magnetron Sputtering // 17.5 Rules and ThesesenOberflächeMaterialprüfungphysikalische ChemieMaterialwissenschaft621671book