Deposition of thick doped polysilicon films with low stress in an epitaxial reactor for surface micromachining applications

Kirsten, M.M.KirstenWenk, B.B.WenkEricson, F.F.EricsonSchweitz, J.A.J.A.SchweitzRiethmüller, W.W.RiethmüllerLange, P.P.Lange2022-03-032022-03-031995https://publica.fraunhofer.de/handle/publica/18603310.1016/0040-6090(94)06449-0en621541Deposition of thick doped polysilicon films with low stress in an epitaxial reactor for surface micromachining applicationsjournal article