Vergöhl, M.M.VergöhlMalkomes, N.N.MalkomesMatthée, T.T.MatthéeBräuer, G.G.Bräuer2022-03-092022-03-092000https://publica.fraunhofer.de/handle/publica/335373Different plasma control systems are applied for the stabilization of the reactive magnetron sputter process within the transition mode with power densities of up to 6 W/cm². Ex-situ spectroscopic ellipsometry and spectral photometry are used for analyzing low-e coatings on glass. Ex-situ/in-line ellipsometry on a large area coater was applied to monitor the film thicknesses of completed low-e coatings on moving substrates. A new optical measurement system is presented which was applied for in-situ/in-line spectroscopic ellipsometry. The thickness of different low-e coatings were monitored during the deposition process. Process drift as well as product changes were monitored with the setup.enreactive magnetron sputteringlarge area coatingin-situ ellipsometryprocess control667conference paper