Asmussen, F.F.AsmussenBetz, H.H.BetzChen, B.T.B.T.ChenHeuberger, A.A.HeubergerPongratz, S.S.PongratzSotobayashi, H.H.SotobayashiSchnabel, W.W.Schnabel2022-03-022022-03-021983https://publica.fraunhofer.de/handle/publica/172043enLithographiePhotolackRöntgenstrahlen541Properties of crosslinked positiv-acting X-ray, resists, fabricated on the basis of polymethylmethacrylate - co-methacryl chloridejournal article