Tailoring the structure of low-temperature-deposited microcrystalline silicon films by biasing the substrate

Birkholz, M.M.BirkholzSelle, B.B.SelleFuhs, W.W.FuhsWilliamson, D.L.D.L.Williamson2022-03-092022-03-092001https://publica.fraunhofer.de/handle/publica/3391952-s2.0-0035556364en667Tailoring the structure of low-temperature-deposited microcrystalline silicon films by biasing the substrateconference paper