Kaiser, N.N.Kaiser2022-03-092022-03-092001https://publica.fraunhofer.de/handle/publica/338134With the aim to engineer optical properties, thin film formation is reviewed as a process starting with nucleation followed by coalescence and subsequent thickness growth, all stages of which can be influenced by deposition parameters.enoptical coatinginterference coatingthin films for opticsdielectric620conference paper