Prediction of wafer homogeneity maps using a virtual metrology scheme consisting of time resolved OES measurements and a neural network

Zimmermann, SvenSvenZimmermannReich, RenèRenèReichZacher, ManuelaManuelaZacherSchulz, Stefan E.Stefan E.SchulzGeßner, ThomasThomasGeßner2022-03-112022-03-112011https://publica.fraunhofer.de/handle/publica/373985enPrediction of wafer homogeneity maps using a virtual metrology scheme consisting of time resolved OES measurements and a neural networkconference paper