Szyszka, B.B.SzyszkaSittinger, V.V.SittingerRuske, F.F.RuskeWerner, W.W.WernerPflug, A.A.PflugRech, B.B.Rech2022-03-102022-03-102005https://publica.fraunhofer.de/handle/publica/350614We report on transparent and conductive ZnO:Al films deposited by reactive AC magnetron sputtering for large area a-Si:H thin film solar cells. Up to now, the highest efficiency of a-Si:H thin film solar cells has been achieved using ceramic ZnO:Al2O3 target material. We have developed the reactive AC magnetron sputtering for the large area in-line deposition of ZnO:Al films on glass substrates as a competitive high rate and low cost technology. These films with minimum resistivity of 260 (A Wem allow for reproducible initial cell efficiencies of more than 9% for single junction amorphous silicon solar cells on commercial float glass substrates.en667conference paper