Kaiser, N.N.KaiserAnton, B.B.AntonJänchen, H.H.JänchenMann, K.K.MannEva, E.E.EvaFischer, C.C.FischerHenking, R.R.HenkingRistau, D.D.RistauWeißbrodt, P.P.WeißbrodtMademann, D.D.MademannRaupach, L.L.RaupachHacker, E.E.Hacker2022-03-092022-03-091995https://publica.fraunhofer.de/handle/publica/324521LaF3/MgF2 -dielectric thin film combinations can be applied in optics for wavelengths down to 150 nm. Several such HR systems for a wavelength of 248 nm were investigated. In these coatings, the influence of laser conditioning on damage threshold and absorptivity was found to be remarkable. XPS- and TEM-investigations showed that the conditioning effect is related to structural and stoichiometric changes in the multilayers, especially in the near-surface-sublayers.enDünne optische Schichtexcimer laser opticsExcimer-Laser-Optikfluoride thin filmsFluoridschichtlaser induced damage thresholdLaserzerstörschwelleoptical coatingoptical thin filmsoxide thin filmsOxidschichtultraviolet spectral regionultravioletter SpektralbereichUV620conference paper