Köhler, B.B.KöhlerMeissner, O.O.MeissnerMelov, V.G.V.G.MelovSchreiber, J.J.Schreiber2022-03-092022-03-091997https://publica.fraunhofer.de/handle/publica/328495en620658670Investigations of relaxation effects in Cu-lines on Si-substratesconference paper