Erdmann, A.A.ErdmannGordon, R.R.GordonMcCallum, M.M.McCallumRosenbusch, A.A.Rosenbusch2022-03-032022-03-032001https://publica.fraunhofer.de/handle/publica/199640Optical simulation programs that solve Maxwell´s equations can explain three dimensional effects on advanced photomasks that impact real world lithography, especially when using alternating phase-shift masks.enoptische Lithographiesimulationrigorose BeugungstheoriePhasenmaske670620530621journal article