Ultra low-loss low-efficiency diffraction gratings

Clausnitzer, T.T.ClausnitzerKley, E.-B.E.-B.KleyTünnermann, A.A.TünnermannBunkowski, A.A.BunkowskiBurmeister, O.O.BurmeisterDanzmann, K.K.DanzmannSchnabel, R.R.SchnabelDuparre, A.A.Duparre2022-03-032022-03-032005https://publica.fraunhofer.de/handle/publica/20826510.1364/OPEX.13.0043702-s2.0-22744442767The realization of ultra low-loss dielectric reflection gratings with diffraction efficiencies between 7% and 0.02% is presented. By placing the grating beneath the highly reflective layerstack scattering was significantly reduced. This concept allows the all-reflective coupling of high laser radiation to high finesse cavities, thereby circumventing thermal effects caused by absorption in the substrate.endielectric materialselectromagnetic wave diffractioninterferometrylight absorptionlight reflectionlight scatteringthermal effect620621Ultra low-loss low-efficiency diffraction gratingsjournal article