Burenkov, A.A.BurenkovTietzel, K.K.TietzelHössinger, A.A.HössingerLorenz, J.J.LorenzRyssel, H.H.RysselSelberherr, S.S.Selberherr2022-03-032022-03-032000https://publica.fraunhofer.de/handle/publica/197348The high accuracy which is necessary for modern process simulation often requires the use of Monte-Carlo ion implantation simulation methods with the disadvantage of very long simulation times especially for three-dimensional applications. In this work a new method for an accurate and CPU time efficient three-dimensional simulation of ion implantation is suggested. The approach is based on a combination of the algorithmic capabilities of a fast analytical and the Monte-Carlo simulation method.enion implantationthree-dimensionalMonte CarloanalyticalIonenimplantationdreidimensionalanalytischsimulation670620530621journal article