Heber, J.J.HeberMühlig, C.C.MühligTriebel, W.W.TriebelDanz, N.N.DanzThielsch, R.R.ThielschKaiser, N.N.Kaiser2022-03-032022-03-032003https://publica.fraunhofer.de/handle/publica/20413710.1007/s00339-002-1502-9Fluorescence experiments have been performed to study the interaction of 193-nm laser radiation with dielectric thin films of LaF/sub 3/, AlF/sub 3/, and MgF/sub 2/. Spectral- and time-resolved measurements reveal the presence of cerium in LaF/sub 3/ and the influence of hydrocarbons in MgF/sub 2/ and LaF/sub 3/. Virtually no fluorescence response is observable in the case of AlF/sub 3/. Supplementary measurements on multilayer stacks confirm the contribution of hydrocarbon and cerium emission in high-reflective UV mirrors upon ArF excimer laser irradiation. Energy density dependent measurements indicate a linear absorption process as the origin of UV laser induced fluorescence in LaF/sub 3/. Luminescence calculations are applied as a helpful tool in order to account for interference effects that are inherently to be found in the multilayer emission spectra.endeep UV laser induced fluorescencefluoride thin filmsdielectric thin filmsLaF/sub 3/AlF/sub 3/MgF/sub 2/time-resolved measurementshydrocarbonsmultilayer stackscerium emissionhigh-reflective UV mirrorsArF excimer laser irradiationenergy density dependent measurementslinear absorption processinterference effectsmultilayer emission spectra193 nm620621journal article