The E-beam application of highly sensitive positive and negative tone X-ray resists for X-ray mask making

Dammel, R.R.DammelDemmeler, R.R.DemmelerEhrlich, C.C.EhrlichKohlmann, K.K.KohlmannLingnau, J.J.LingnauPongratz, S.S.PongratzReimer, K.K.ReimerScheunemann, U.U.ScheunemannTheis, J.J.Theis2022-03-082022-03-081989https://publica.fraunhofer.de/handle/publica/316401en621The E-beam application of highly sensitive positive and negative tone X-ray resists for X-ray mask makingconference paper