Schulz, UlrikeUlrikeSchulzMunzert, PeterPeterMunzertRickelt, FriedrichFriedrichRickeltKaiser, NorbertNorbertKaiser2022-03-042022-03-042013https://publica.fraunhofer.de/handle/publica/23183610.1016/j.tsf.2012.11.1532-s2.0-84875230071Antireflective structures with features of sub-wavelength size are appropriate as an alternative to interference coatings for obtaining antireflective properties on optical surfaces. For broadband antireflection or a wide range of incidence angles, a distinct structure depth together with a very low lateral structure size is required, which is difficult to realize. Design considerations show that also thinner nanostructured layers are useful if they are combined with compact interference layers. A nanostructured low-index melamine layer has been prepared by plasma-etching of a vacuum deposited organic thin film. In combination with homogeneous silica layers antireflection properties for a broad range of light incidence angles were achieved.enanti-reflectionnanostructureplasma-etchingorganic layerphysical vapor deposition620541journal article