Hartmann, E.E.HartmannRadojkovic, P.P.RadojkovicSchwartzkopff, M.M.SchwartzkopffMarquardt, P.P.MarquardtSteinberger, H.H.Steinberger2022-03-082022-03-082002https://publica.fraunhofer.de/handle/publica/305312The method involves the deposition of individual or numerous NANO-particles on the substrate after which selected particles are fused with each other and/or with the substrate. The fusion takes places preferably after positioning selected NANO-particles defining a functional structure, or an electronic component. Typically the selective positioning is carried out by using a raster or grid probe microscopy, whose voltage pulse duration, amplitude, and polarity is adjusted according to preset parameters. A raster probe, or power microscope may be used. The fusing may comprise controlled voltage and current increase. ADVANTAGE - Rational manufacturing facility with reduced capability to produce flaw.de608621patent1996-19619287