The impact of EUV mask defects on lithographic process performance

Evanschitzky, P.P.EvanschitzkyErdmann, A.A.Erdmann2022-03-102022-03-102004https://publica.fraunhofer.de/handle/publica/34671610.1117/12.5680132-s2.0-3843117622en670620530The impact of EUV mask defects on lithographic process performanceconference paper