Sambale, C.C.SambaleSchmöller, T.T.SchmöllerErdmann, A.A.ErdmannEvanschitzky, P.P.EvanschitzkyKalus, C.C.Kalus2022-03-092022-03-092003https://publica.fraunhofer.de/handle/publica/342487en670620530Rigorous simulation of defective EUV multilayer masksconference paper