Fühner, T.T.FühnerErdmann, A.A.ErdmannSeifert, S.S.Seifert2022-03-032022-03-032007https://publica.fraunhofer.de/handle/publica/21401210.1117/1.27850312-s2.0-40149108782en621670Direct optimization approach for lithographic process conditionsjournal article