Klein, C.C.KleinPlatzgummer, E.E.PlatzgummerKlikovits, J.J.KlikovitsPiller, W.W.PillerLoeschner, H.H.LoeschnerBejdak, T.T.BejdakDolezel, P.P.DolezelKolarik, V.V.KolarikKlingler, W.W.KlinglerLetzkus, F.F.LetzkusButschke, J.J.ButschkeIrmscher, M.M.IrmscherWitt, M.M.WittPilz, W.W.PilzJaschinsky, P.P.JaschinskyThrum, F.F.ThrumHohle, C.C.HohleKretz, J.J.KretzNogatch, J.T.J.T.NogatchZepka, A.A.Zepka2022-03-112022-03-112009https://publica.fraunhofer.de/handle/publica/36555910.1117/12.813670Projection Mask-Less Lithography (PML2) is a potentially cost-effective multi electron-beam solution for the 22 nm half-pitch node and beyond. PML2 is targeted on using hundreds of thousands of individually addressable electron-beams working in parallel, thereby pushing the potential throughput into the wafers per hour regime. With resolution potential of < 10 nm, PML2 is designed to meet the requirements of several upcoming tool generations.en621conference paper