Correlation analysis: A fast and reliable method for a better understanding of simulation models in optical lithography

Tollkühn, B.B.TollkühnHeubner, A.A.HeubnerElian, K.K.ElianRuppenstein, B.B.RuppensteinErdmann, A.A.Erdmann2022-03-102022-03-102005https://publica.fraunhofer.de/handle/publica/34947710.1117/12.599390en670620530Correlation analysis: A fast and reliable method for a better understanding of simulation models in optical lithographyconference paper