Kaiser, N.N.KaiserBodemann, A.A.BodemannRaupach, L.L.RaupachWeißbrodt, P.P.WeißbrodtHacker, E.E.Hacker2022-03-092022-03-091996https://publica.fraunhofer.de/handle/publica/325876A UHV surface analysis system combined with an optical setup was used in the present work to study the conditioning mechanism on MgF2/LaF3HR coatings at 248 nm excimer laser wavelength. During laser irradiation of the sample the laser-induced emission of contaminants and coating material from the sample surface was recorded by a quadrupole mass spectrometer. To analyze changes in composition and chemical bonds of the coating surface XPS-measurements were performed before, during and after irradiation in dependence on sample design, number of pulses and oxygen atmosphere.enDünne optische Schichtexcimer laser opticsExcimer-Laser-Optikfluoride thin filmsFluoridschichtlaser induced damage thresholdLaserzerstörschwelleoptical coatingoptical thin filmsoxide thin filmsOxidschichtultraviolet spectral regionultravioletter SpektralbereichUV620conference paper