Schneider, VeronikaVeronikaSchneiderReimann, ChristianChristianReimannFriedrich, J.J.Friedrich2022-03-082022-03-082012https://publica.fraunhofer.de/handle/publica/309832Cleaning a crucible (12) for processing semiconductor materials, comprises (a) filling (14) the contaminated crucible with a semiconductor material (16), (b) melting the semiconductor material in the contaminated crucible such that impurities (18) from the contaminated crucible are included by the semiconductor material (16'), and (c) removing the semiconductor material with the included-impurities. An independent claim is also included for manufacturing the crucible, comprising carrying out primary forming of the crucible, and carrying out the above mentioned method.de670Aufreinigung eines Tiegels für eine HalbleiterverarbeitungCleaning a crucible, preferably silicon crucible for processing semiconductor materials, comprises e.g. melting contaminated crucible with a semiconductor material such that impurities from crucible are included by semiconductor materialpatent102012201116