Schulz, U.U.SchulzKnopf, H.H.KnopfRickelt, F.F.RickeltSeifert, T.T.SeifertMunzert, P.P.Munzert2022-03-052022-03-052018https://publica.fraunhofer.de/handle/publica/25678710.1364/OME.8.0021822-s2.0-85050317551Nanostructured layers generated by plasma etching immediately after the evaporation process can exhibit an effective refractive index down to approximately 1.15. uracil, a nucleobase derived from a pyrimidine chemical structure, has been identified to form suitable bump structures in a self-organized way. It is assumed that the molecule's ability to form aggregates plays an essential role in initiating the structure formation. A nanostructured uracil layer has been used as the final layer of an antireflection coating to demonstrate broadband and wide-angle antireflection performance.en620535journal article