Amorphous carbon coatings prepared by high rate rf plasma deposition from fluorinated benzenes

Sah, R.E.R.E.SahBubenzer, A.A.BubenzerDischler, B.B.DischlerKoidl, P.P.Koidl2022-03-022022-03-021985https://publica.fraunhofer.de/handle/publica/17229710.1063/1.95493enDünnschichtfluorierter KohlenwasserstoffPlasmaverfahren621667Amorphous carbon coatings prepared by high rate rf plasma deposition from fluorinated benzenesjournal article