Isenberg, JörgJörgIsenbergReber, StefanStefanReberWarta, WilhelmWilhelmWarta2022-03-032022-03-032003https://publica.fraunhofer.de/handle/publica/20316410.1149/1.1575741en621697541Diffusion properties of ion-implanted vanadium in PECVD-SiO2 and PECVD-SiN(x)journal article