New plasma activation processes during the high-rate electron beam evaporation for large area coating

Scheffel, B.B.ScheffelMetzner, C.C.MetznerGoedicke, K.K.GoedickeKirchhoff, V.V.Kirchhoff2022-03-092022-03-092001https://publica.fraunhofer.de/handle/publica/338435en667670620New plasma activation processes during the high-rate electron beam evaporation for large area coatingconference paper