Kuenzel, H.H.KuenzelBoettcher, J.J.BoettcherHarde, P.P.HardeMaessen, R.R.Maessen2022-03-032022-03-031997https://publica.fraunhofer.de/handle/publica/191752The incongruent evaporation of GaP source material using a conventional effusion cell equipped with a PBN scavenger at the orifice is demonstrated as a simple and cost-effective way to generate a pure P2 molecular beam, suitable for the growth of InP layers in a solid-source MBE system. Low residual carrier concentrations in combination with high mobilities as well as narrow and intense photoluminescence spectra were achieved. While some arsenic incorporation from the growth environment was observed, gallium incorporation is limited to below 0.1% of the group-III lattice sites. n- and p-doping using Si and Be has been investigated. Successful growth of InP/GaInAs heterostructures indicates that the use of the GaP source technique is a viable way for growing AlGaInAs/InP device structures by solid source MBE.enberylliumcarrier densitygallium arsenidehall mobilityiii-v semiconductorsindium compoundsmolecular beam epitaxial growthphotoluminescencereflection high energy electron diffractionsecondary ion mass spectrasemiconductor dopingsemiconductor growthsemiconductor heterojunctionssiliconMBE growthmolecular beam epitaxy growthheterostructuresincongruent evaporationcarrier concentrationscarrier mobilitiesphotoluminescence spectradopingsolid source mbesolid source molecular beam epitaxyhall effectSIMSRHEED400 to 500 c10 k77 k300 kInP621548journal article