Improving the performance of organic field effect transistor by optimizing the gate insulator surface

Zen, A.A.ZenNeher, D.D.NeherSilmy, K.K.SilmyHolländer, A.A.HolländerAsawapirom, U.U.AsawapiromScherf, U.U.Scherf2022-03-032022-03-032005https://publica.fraunhofer.de/handle/publica/20901710.1143/JJAP.44.3721en668530Improving the performance of organic field effect transistor by optimizing the gate insulator surfacejournal article