Under CopyrightStiebel, D.D.StiebelPichler, P.P.PichlerCowern, N.E.B.N.E.B.Cowern2022-03-037.2.20152001https://publica.fraunhofer.de/handle/publica/19970010.1063/1.1406147To simulate transient enhanced diffusion (TED) of dopants after ion implantation, a very accurate model for the interaction of self interstitials with extended defects is indispensable. Recently, such a model has been published by Cowern including the formation of {113} defects via small selfü interstitial clusters. Extracted from experimental results, this continuum model consists of a large set of coupled differential equations and, consequently, simulation times are rather high. In this letter, we present a model based on only seven differential equations leading to almost identical results in comparison to those of the original model. The reduction obtained will allow the application of the clustering model for the simulation of TED in commercial software tool.ensiliciumPunktdefektmakroskopischer DefektNanocluster{113-Defetke}transiente Diffusion670620530621journal article