Lithography with high depth of focus by an ion projection system2

Buchmann, L.-M.L.-M.BuchmannSchnakenberg, U.U.SchnakenbergTorkler, M.M.TorklerLöschner, H.H.LöschnerStengl, G.G.StenglTraher, C.C.TraherFallmann, W.W.FallmannStangl, G.G.StanglCekan, E.E.Cekan2022-03-032022-03-031992https://publica.fraunhofer.de/handle/publica/18162710.1109/84.186390en621Lithography with high depth of focus by an ion projection system2journal article