Comparison of layer properties deposited with unipolar and bipolar pulsed magnetron sputtering

Krause, U.U.KrausePeters, C.C.PetersRettich, T.T.RettichWiedemuth, P.P.Wiedemuth2022-03-092022-03-092002https://publica.fraunhofer.de/handle/publica/339680en667670620Comparison of layer properties deposited with unipolar and bipolar pulsed magnetron sputteringconference paper