Ion assisted deposition of optical coatings on cold substrates. A comparison of processes using different ion sources

Schallenberg, U.U.SchallenbergLaux, D.D.LauxDuparre, A.A.DuparreKaiser, N.N.KaiserKennedy, V.M.V.M.KennedyRistau, D.D.Ristau2022-03-092022-03-091998https://publica.fraunhofer.de/handle/publica/330684Concerning optical and structural properties, for different oxide and fluoride materials IAD-coating processes based on different ion sources (end-hall-, cold-cathode- and advanced plasma source) were compared.enion assisted depositionlow temperature depositionoptical constantsscatteringthin fluoride filmthin oxide film620Ion assisted deposition of optical coatings on cold substrates. A comparison of processes using different ion sourcesconference paper