Trost, MarcusMarcusTrostSchröder, SvenSvenSchröderDuparré, AngelaAngelaDuparréTünnermann, AndreasAndreasTünnermann2022-03-122022-03-122013https://publica.fraunhofer.de/handle/publica/38039910.1364/OIC.2013.FC.4Scattering from multilayers depends on the roughness of each interface and their cross-correlation properties. Oblique deposition of thin films allows tailoring these properties and thus the scattering which will be illustrated for Mo/Si multilayers.en620Scattering reduction through oblique multilayer depositionconference paper