Soer, W.A.W.A.SoerHerpen, M.M.J.W. vanM.M.J.W. vanHerpenJak, M.J.J.M.J.J.JakGawlitza, P.P.GawlitzaBraun, S.S.BraunSalashchenko, N.N.N.N.SalashchenkoChkhalo, N.I.N.I.ChkhaloBanine, V.Y.V.Y.Banine2022-03-042022-03-042012https://publica.fraunhofer.de/handle/publica/22924810.1117/1.JMM.11.2.021118We have investigated the use of atomic-hydrogen-based cleaning to remove Sn contamination from extreme ultraviolet (EUV) multilayer mirrors. Mo and Si surfaces were cleaned at a relatively slow rate due to catalyzed dissociation of tin hydride on these surfaces. Mo/Si mirrors with B4C and Si3N4 cap layers and DLC-terminated DLC/Si mirrors showed complete removal of 10 nm Sn in 20 sec with full restoration of EUV reflectance. In addition, a prolonged cleaning treatment of 300 sec of a DLC/Si mirror resulted in only a minor EUV peak reflection loss of 1.2% absolute and no significant changes in infrared reflectance.en621journal article