Mescheder, U.U.MeschederMund, F.F.MundTrube, J.J.TrubeWindbracke, W.W.WindbrackeHuber, H.-L.H.-L.HuberPongratz, S.S.Pongratz2022-03-082022-03-081988https://publica.fraunhofer.de/handle/publica/315286en621Subhalf micron critical dimension control in X-ray lithography mask technologyconference paper