Kühne, M.M.KühnePetzold, H.-C.H.-C.Petzold2022-03-022022-03-021989https://publica.fraunhofer.de/handle/publica/1769312-s2.0-0024734376A method is described to determine the soft X-ray emission of pulsed plasma sources for X-ray lithography. It is based on a comparison between resist exposures to the plasma sources under investigation and to synchrotron radiation from the electron storage ring BESSY. The method was applied to laser produced plasmas which were generated by laser radiation pulses of different laser Wavelengths and pulse energies.en621journal article