Hild, Olaf RüdigerOlaf RüdigerHildPhilipp, AndréAndréPhilippGil, Tae HyunTae HyunGil2022-03-082022-03-082014https://publica.fraunhofer.de/handle/publica/310384US2014291650A [EN] A method for manufacturing an organic device includes the steps of applying a photoresist onto at least an active first region arranged on a substrate of the organic device, and removing the photoresist from the substrate in a second region adjacent to the active first region. Additionally, the method includes the steps of applying a passivation layer onto the first and second regions and removing the photoresist and the passivation layer in the active first region.de620667670patent102013205714