Resistless Ga+ beam lithography for flexible prototyping of nanostructures in different materials by reactive ion etching

Under CopyrightRommel, MathiasMathiasRommelRumler, MaximilianMaximilianRumlerHaas, AnkeAnkeHaasBeuer, SusanneSusanneBeuer2022-03-137.7.20172017https://publica.fraunhofer.de/handle/publica/39701010.24406/publica-fhg-397010enfocused ion beam (FIB)resistless Ga+ lithographyetch maskdry etchingRIEnanopatterning670620530Resistless Ga+ beam lithography for flexible prototyping of nanostructures in different materials by reactive ion etchingpresentation