Dura, H.-G.H.-G.DuraGassel, H.H.GasselMokwa, W.W.MokwaVogt, H.H.Vogt2022-03-082022-03-081992https://publica.fraunhofer.de/handle/publica/320224enÄtzenburied oxideepitaxial layerEpitaxialschichtetch stopetchingMembranMembranesSIMOX621SIMOX, an efficient etch-stop to fabricate silicon membranes with well defined thickness. Part 1conference paper