Deposition and treatment of titanium based barrier layers by MOCVD

Ecke, R.R.EckeSchulz, S.E.S.E.SchulzGessner, T.T.GessnerRiedel, S.S.RiedelLipp, E.E.LippEizenberg, M.M.Eizenberg2022-03-092022-03-092003https://publica.fraunhofer.de/handle/publica/342132en621Deposition and treatment of titanium based barrier layers by MOCVDconference paper