Schiller, S.S.SchillerHeisig, U.U.HeisigKorndörfer, C.C.KorndörferBeister, G.G.BeisterReschke, J.J.ReschkeSteinfelder, K.K.SteinfelderStrümpfel, J.J.Strümpfel2022-03-082022-03-081987https://publica.fraunhofer.de/handle/publica/316073en667670620Reactive d.c. high-rate sputtering as production technologyconference paper