Steingrüber, R.R.SteingrüberMöhrle, M.M.Möhrle2022-03-102022-03-102005https://publica.fraunhofer.de/handle/publica/34932610.1016/j.mee.2004.12.009The fabrication of gratings for DFB-lasers by direct write electron-beam lithography under consideration of design rule aspects is presented. The mostly common targeted duty cycle value of 0.5 can be either achieved by exposing a designed equal line/space ratio of 0.5 or a smaller ratio implying the necessity to raise the exposure dose in order to obtain equal lines and spaces in the developed resist pattern. We found that the latter way results in an increase of process tolerance without loosing device characteristics.en621conference paper