Under CopyrightFader, RobertRobertFaderRumler, M.M.RumlerRommel, MathiasMathiasRommelBauer, A.J.A.J.BauerFrey, L.L.FreyVerschuuren, M.A.M.A.VerschuurenLaar, R. van deR. van deLaarJi, R.R.JiSchömbs, U.U.Schömbs2022-03-126.11.20132013https://publica.fraunhofer.de/handle/publica/38111410.24406/publica-fhg-381114en670620530Accuracy of wafer level alignment with substrate conformal imprint lithographypresentation