Kaiser, N.N.KaiserWelsch, E.E.WelschEttrich, K.K.EttrichBlaschke, H.H.BlaschkeSchäfer, D.D.SchäferThomsen-Schmidt, P.P.Thomsen-Schmidt2022-03-032022-03-031996https://publica.fraunhofer.de/handle/publica/188476The interaction of UV laser radiation with optical coatings is shown to be properly investigated by a pulsed two probe-beam photothermal technique. UV laser damage resistivity studies on LaF3/MgF2, Al2O3/SiO2, HfO2/SiO2 multilayer stacks have been performed at lambda = 248 nm, tau = 20 ns. Investigating these by changing the number of (HL) pairs and the substrate material, optical and thermal coating properties were shown to be responsible for UV single-shot laser damage. Similarly, the damage threshold of selected samples is to be influenced by the deposition technique. The influence of the bandgap energy of typical UV thin-film oxide materials on the damage has been investigated. Furthermore, multishot damage measurements on LaF3/MgF2, high-reflecting multilayer coatings reveal the accumulation of laser energy in the predamage range.enDünne optische Schichtexcimer laser opticsfluoride thin filmsFluoridschichtlaser induced damage thresholdLaserzerstörschwelleoptical coatingoptical thin filmsoxide thin filmsOxidschichtultraviolet spectral regionultravioletter SpektralbereichUV620journal article