Handte, ThomasThomasHandteHofmann, MartinMartinHofmannBehrens, ArneArneBehrensSinzinger, StefanStefanSinzinger2023-07-312023-07-312022https://publica.fraunhofer.de/handle/publica/44630010.1109/IPC53466.2022.99755962-s2.0-85145598924The combination of a multi-layer resist system for soft UV-NIL with a fluorine-based plasma etching is investigated to elaborate homogeneously distributed nanosized features in silicon carbide. Initial studies substantiate that this approach can be a timesaving and cost-effective alternative to generate nanostructures in SiC.ennanoimprint lithographynanostructuresplasma etchingsilicon carbideconference paper