Kaiser, N.N.KaiserKaiser, U.U.KaiserWeißbrodt, P.P.WeißbrodtMademann, D.D.MademannHacker, E.E.Hacker2022-03-082022-03-081993https://publica.fraunhofer.de/handle/publica/321141In the thickness range 50nm-500nm at substrate temperatures of 300K, 375K, and 575K the structure of physical-vapour-deposited magnesium, lanthanum, calcium, and lithium fluoride films were investigated using TEM microfractographical replication technique. Two growth groups, columnar and granular growth, were found and main structure buildings elements with its characteristical medium size have been determined. Using SIMS, SNMS, RBS, and partially spectroscopical and gravimetrical measurements, the O and C contamination of the films has been investigated. The quantitative results were related to the characteristical structure building elements.enDünne optische Schichtexcimer laser opticsExcimer-Laser-Optikfluoride thin filmsFluoridschichtlaser induced damage thresholdLaserzerstörschwelleoptical coatingoptical thin filmsoxide thin filmsOxidschichtultraviolet spectral regionultravioletter SpektralbereichUV620conference paper