Kreutz, E.W.E.W.KreutzVoss, A.A.VossAlunovic, M.M.AlunovicFunken, J.J.FunkenSung, H.H.Sung2022-03-032022-03-031993https://publica.fraunhofer.de/handle/publica/18313410.1016/0257-8972(93)90050-XThe temporal and spatial properties of laser-induced vapour and/or plasma involved in thin film deposition were investigated as a function of laser parameters (wavelength, power density distribution) and processing variables (target-substrate arrangement, superposed r.f. fields). The composition and ionization state of the vapour and plasma were measured by emission spectroscopy, and the geometry and dynamics of the vapour-plasma plume were measured by high-speed photography. The number and type of ionized species impinging on the growing films were varied in combination with the target-substrate arrangement to generate various film structures which are discussed with respect to applications.enemission spectroscopyexperimental apparatusfibre techniquefilm technologyvapour-plasma plume621543journal article